Senior Architect - OPC & Lithographic Modeling

Job Description and Requirements

You Are:
You are a passionate and innovative engineer with a strong background in lithography modeling and computational techniques. You thrive in a collaborative environment and are driven by the desire to solve complex problems. Experience with machine learning concepts for computational lithography, metrology data collection, mask making processes, or etch compact modeling is a strong plus. You possess excellent problem-solving skills, a passion for innovation, and enjoy collaborating across international teams.

What You'll Be Doing:

1. Work with a multi-disciplinary team to identify new or improved methodological approaches to mask, resist or etch modeling for rigorous and compact solutions.
2. Develop and deploy new modeling and data methods for lithographic patterning.
3. Conduct trend analysis of wafer vs modeling results to gain understanding of newly desired model enhancements; guide pathfinding of new components and generate new innovative ideas to improve modeling or patterning solutions.
4. Provide specifications for R&D implementation, draft prototypes, and perform model testing including reporting.
5. Develop engineering-level technical documentation for the supported products and provide training to field support team and end users.
6. Influence product roadmap and define modeling strategy in your area of responsibility.
7. Support customers and guide local field teams in conducting model engagements.

The Impact You Will Have:

1. Advance technology and tool adoption of rigorous and compact OPC modeling solutions for future DUV and future EUV lithography nodes.
2. Drive innovations that will shape the future of semiconductor manufacturing.
3. Shape the development of cutting-edge lithography simulation solutions.
4. Enhance the performance and accuracy of lithographic patterning models.
5. Support critical device production for advanced memory and logic products.
6. Facilitate the deployment of computational ILT Technology in manufacturing flows.

What You'll Need:

1. Ph.D., M.S., or B.S. in Chemistry, Physics, Electrical Engineering, Computer Science, or related fields with strong hands-on experience in lithographic patterning.
2. Excellent understanding of optics, resist chemistry, or material physics.
3. Proficiency in scripting languages such as Python 3, Matlab, or TCL.
4. Familiarity with statistical data processing or visualization libraries.
5. Experience with machine learning concepts for computational lithography is a plus.
6. Hands-on experience with SEM metrology tools, mask making processes, or etch compact modeling is desirable but not mandatory.

Who You Are:

1. Great problem-solving skills.
2. Passion for innovation.
3. Enjoy collaboration across international teams.

The Team You'll Be A Part Of:

Our EDAG Business group (Mask Solutions & Smart Manufacturing) is a globally leading supplier of lithography simulation solutions for advanced semiconductor manufacturers. We are the leader in computational ILT Technology, deployed at the most advanced memory and logic products. Our computational S- Litho platform is used in the early pathfinding stage for new technology nodes development as well as in manufacturing flows for the most critical device production.

We Are:

At Synopsys, we drive the innovations that shape the way we live and connect. Our technology is central to the Era of Pervasive Intelligence, from self-driving cars to learning machines. We lead in chip design, verification, and IP integration, empowering the creation of high-performance silicon chips and software content. Join us to transform the future through continuous technological innovation.

Rewards and Benefits:

We offer a comprehensive range of health, wellness, and financial benefits to cater to your needs. Our total rewards include both monetary and non-monetary offerings. Your recruiter will provide more details about the salary range and benefits during the hiring process.

Inclusion and Diversity are important to us. Synopsys considers all applicants for employment without regard to race, color, religion, national origin, gender, sexual orientation, gender identity, age, military veteran status, or disability.